my country's microelectronics field has achieved rapid development in recent years, and the market scale is growing. However, in the early years, limited by technical barriers, it faced severe technical research and development tasks and market competition pressure. Facing this challenge, Zhai Guanjie led the Saiyuan Microelectronics R&D team to face the technical problems encountered in the patent research and development process, overcome technical barriers that were difficult to start, and achieved even higher levels of innovative development.

Saiyuan Microelectronics has been focusing on product research and development and innovation in the field of MCU integrated circuits for many years. In the process of innovation and technology development, the related issues of advanced process research and development and patented technology industrialization have always been prominent, and it has become an urgent need to overcome in front of Zhai Guanjie. The gap.

The first is the issue of advanced process research and development. There is a well-known Moore's Law in the integrated circuit industry. Although MCUs are relatively slow to follow up with Moore's Law than consumer products (such as mobile phones and audio and video products), advanced manufacturing processes will still make products faster and lower power consumption. , Lower cost is a key factor in the competitiveness of products, and it is also an important link that affects the development of the industry. Since the establishment of Saiyuan Microelectronics, in order to improve product performance and shape product competitiveness, there will be a generation of process upgrades every three years or so. Since its establishment in 2011, the company has so far gone through several generations of process research and development such as 0.35um, 0.18um and 90nm. With more advanced manufacturing processes and reduced line widths, ICs work faster, consume less power, and have lower costs. However, great technical difficulties are also highlighted in terms of reliability issues such as anti-interference and anti-static .

Advanced manufacturing process means a substantial increase in research and development costs and labor input costs. The R&D cost of the first-generation process upgrade will be 5-10 times higher than that of the previous-generation product, which shows the risk factor and R&D pressure. From R&D to the final sale of integrated circuits to users, it often takes several years, spending millions or even tens of millions of yuan in funds, instilling tears of countless failures and the courage to start all over again. The team needs an indomitable iron will, an attitude of indifferent wealth, and a continuous sense of innovation in order to actually improve product performance through countless improvements and upgrades, and use products to speed up the intelligence and convenience of life.

The industrialization of patents should also be treated with caution. From a global perspective, patents are mostly born within scientific research institutions, and the proportion of actual use and industrialization is very low. Saiyuan Microelectronics has been deeply involved in Shenzhen, the famous city of makers in my country, and it is the first responsibility to develop innovative patented technological achievements that solve the actual problems of users. Of course, the process of moving from theory to practice will not be accomplished overnight. Environmental and mass production issues are gulfs that cannot be bypassed on the road to technological innovation.

To further illustrate the problem of the industrialization of patented technology, the specific industrialization of Saiyuan capacitance sensing water level detection patent is a vivid example. Traditional water level detection mostly relies on mechanical structures, such as the floating ball of the toilet; there are also electronic switch structures, such as the reed switch of the humidifier and the conductive rod of the soymilk machine; and the communication structure of the water dispenser. Saiyuan's innovative patent adopts a non-contact situation, which can realize water level detection without contact with water, thus ensuring the sanitary condition of the water, and the product is also more compact. Saiyuan's innovative industrialization of water level detection has also gone through many stages such as principle innovation, laboratory success, product feasibility, and specific customer use. At the same time, it needs to solve a lot of problems in this process. Issues including environmental changes, structural installation, environmental impact and consistency are all obstacles to mass production, and they are all important factors that affect whether patents can be industrialized. After long-term trials led by Zhai Guanjie and mass production inspections by many users, Saiyuan Microelectronics' water level detection IC SCW8916B finally helped Saiyuan complete the industrialization of water level detection technology. After ups and downs, it finally became a veritable industry leader. Industry development and progress made outstanding contributions.